Volume 10, Issue 3 (2010)                   MJEE 2010, 10(3): 87-99 | Back to browse issues page

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Ghassemi M, Mohseni H, Niayesh K, Shayegani Akmal A A. Static Behaviour Modeling of Dielectric Barrier Discharges and Dielectric Dynamic Charging in High Voltage Applications. MJEE 2010; 10 (3) :87-99
URL: http://mjee.modares.ac.ir/article-17-4159-en.html
Static Behaviour Modeling of Dielectric Barrier Discharges and Dielectric Dynamic Charging in High Voltage Applications
Mona Ghassemi 1, Hossin Mohseni1 , Kaveh Niayesh1 , Amir abbas Shayegani Akmal1
1- University of Tehran
Abstract:   (5811 Views)
Although in recent two decades, the concept of Dielectric Barrier Discharges (DBDs) have been developed in ozone production well, air pollution control, plasma screens and control of chemical, and biological and medical processes, employment of this concept for high voltage applications to improve insulation performance as an alternative to the pressurized gas-insulated systems (GIS) utilizing SF6, is still in research phase. In this paper, the enhancement of insulation performance using DBD and with increasing charge densities on the barrier surfaces in uniform electric filed has been statically modeled. This means that the dynamics of the development of space charges and the manner they sit on the barrier surfaces are ignored and only DBD concepts considering different amounts of surface charges on the barrier surfaces are evaluated. Also the influence of various parameters, such as permeability of the dielectric material, its thickness, and length of air gap, on the enhancement of insulation performance are evaluated. Then an algorithm for the formation of space charges, settling on the barrier surfaces and electric filed modification in the air gap for three types of voltage including DC, AC and lightning impulse, is simulated and evaluated using MATLAB. In this modeling, dielectrics are considered as non-insulating with some electrical conductivity.
Keywords: DBD, DBD, Static and Dynamic Modelling, Uniform Electric Field, High Voltage Applications
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Received: 2010/07/16 | Accepted: 2010/12/16 | Published: 2011/02/14
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